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Correlation between lasing properties and band alignment of edge emitting lasers with (Ga,In)(N,As)/Ga(N,As) active regions

机译:具有(Ga,In)(N,As)/ Ga(N,As)有源区的边缘发射激光器的激光特性与能带对准之间的相关性

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We have investigated the optical properties of edge-emitting laser structures containing three Ga0.7In0.3N0.005As0.995 quantum wells embedded in GaNxAs1-x barriers grown by metal-organic vapour-phase epitaxy. In a series of three samples the nitrogen content x of the barrier was varied from 0% to 3%. We studied the optical transitions using pressure-dependent photomodulated reflectance (PR) up to 20 kbar at room temperature. Additionally we measured the pressure dependence of the lasing energy and the threshold current of the corresponding laser structures as function of hydrostatic pressure. Due to the large redshift of the Ga(N,As) band gap with increasing N of about 150 meV per percent N, the variation of x leads to a considerable change of the carrier confinement particularly of electrons. The strong increase of the threshold current of the laser device with pressure suggests a swiftly increasing threshold carrier density due to the increasing effective mass and non-parabolicity. Comparing the pressure dependence of the lasing energy and the conduction band edge supports this conclusion. [References: 17]
机译:我们已经研究了边缘发射激光结构的光学特性,该结构包含三个Ga0.7In0.3N0.005As0.995量子阱,这些量子阱嵌入通过金属有机气相外延生长的GaNxAs1-x势垒中。在一系列的三个样品中,阻挡层的氮含量x在0%到3%之间变化。我们在室温下使用高达20 kbar的压力相关光调制反射率(PR)研究了光学跃迁。另外,我们测量了激光能量的压力依赖性以及相应的激光结构的阈值电流作为静水压力的函数。由于Ga(N,As)带隙的大红移,随N的增加(每N百分比)N的增加约为150 meV,x的变化会导致载流子限制(尤其是电子)发生显着变化。激光设备的阈值电流随压力的强烈增加表明,由于有效质量和非抛物线的增加,阈值载流子密度迅速增加。比较激光能量和导带边缘的压力依赖性可以支持这一结论。 [参考:17]

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