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首页> 外文期刊>Physica status solidi, B. Basic research >Photoluminescence studies of Mg-doped and Si-doped gallium nitride epilayers
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Photoluminescence studies of Mg-doped and Si-doped gallium nitride epilayers

机译:掺镁和掺硅氮化镓外延层的光致发光研究

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摘要

We present time-, temperature- and intensity-dependent photoluminescence measurements of undoped, n-type and p-type GaN epilayers. In the nominally undoped samples we observe at low temperatures the trapping of free excitons by neutral donors and subsequent radiative recombination. In the n-type Si-doped samples bound-exciton luminescence is dominant over a wide range of temperatures. The luminescence from p-type Mg-doped samples is dominated by shallow-donor-shallow-acceptor pair recombination and by a deep blue centres at 3.0 eV. These two emission bands show identical temperature and linear intensity dependence. [References: 22]
机译:我们介绍了未掺杂,n型和p型GaN外延层的时间,温度和强度相关的光致发光测量。在名义上未掺杂的样品中,我们在低温下观察到中性施主捕获了自由激子,并随后发生了辐射复合。在n型掺杂硅的样品中,束缚激子发光在很宽的温度范围内均占主导地位。 p型掺杂Mg的样品的发光主要由浅施主-浅受体对重组和3.0 eV的深蓝色中心决定。这两个发射带显示出相同的温度和线性强度依赖性。 [参考:22]

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