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首页> 外文期刊>Philosophical Magazine, A. Physics of condensed matter, defects and mechanical properties >In-situ transmission electron microscopy studies of the interaction between dislocations in strained SiGe/Si(001) heterostructures
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In-situ transmission electron microscopy studies of the interaction between dislocations in strained SiGe/Si(001) heterostructures

机译:SiGe / Si(001)异质结构中位错之间相互作用的原位透射电镜研究

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The rate of misfit strain relaxation in semiconductor heterostructures is controlled by the kinetics of misfit dislocation nucleation, propagation and interaction. Although there have been a number of detailed theoretical studies of the dislocation-dislocation interaction process in these systems, there exist limited experimental data regarding the regime of epilayer thickness and composition where these interactions affect strain relaxation. Because of its high spatial and temporal resolution, in-situ transmission electron microscopy is an ideal experimental tool with which to observe dislocation interactions. In this work, the unique capabilities of an ultrahigh vacuum transmission electron microscope have been exploited to permit direct, real-time observation of dislocation interactions. This microscope is equipped with in-situ chemical vapour deposition capabilities which allow imaging of dislocation motion during both growth and annealing of SiGe/Si(001) heterostructures. This has permitted efficient determination of the regime of epilayer thickness and composition where dislocation interactions stop the forward motion of the threading dislocation segment. At the lowest thicknesses and compositions, all dislocation interactions cause the threading segment to become blocked. Above a certain level of thickness and composition dislocation motion is halted only when the two dislocations have parallel Burgers vectors. This is due to a particular reaction between the dislocations which occurs at their intersection. Quantitative analysis of the dynamic motion of threading dislocations while in the presence of the stress field of the interfacial segment allows extraction of the magnitude of the long range interaction stresses. It is seen that the magnitude of the interaction stresses increases as the net excess stress in the epilayer increases, and that the interaction stresses are much greater when the Burgers vectors are parallel. Finally, additional experiments have indicated that dislocations that become blocked during annealing form relatively stable configurations. Following the blocking event a force greater than that associated with the long range interaction between dislocations is required to release the dislocations from their blocked configuration. This is ill contrast to theoretical models, which predict that the long range interaction force alone controls the release of dislocations. These experiments represent the first systematic study of dislocation interactions in strained heterostructures and permit improved predictive models of the kinetics of strain relaxation in these systems. [References: 51]
机译:半导体异质结构中失配应变弛豫的速率由失配位错成核,传播和相互作用的动力学控制。尽管在这些系统中进行了许多有关位错-位错相互作用过程的详细理论研究,但是关于这些相互作用影响应变松弛的外延层厚度和成分的机制,仍然存在有限的实验数据。由于其高的时空分辨率,原位透射电子显微镜是观察位错相互作用的理想实验工具。在这项工作中,已经利用超高真空透射电子显微镜的独特功能来直接,实时观察位错相互作用。该显微镜配备有原位化学气相沉积功能,可以对SiGe / Si(001)异质结构的生长和退火过程中的位错运动进行成像。这允许有效地确定外延层的厚度和组成的状态,其中位错相互作用阻止了螺纹位错段的向前运动。在最低的厚度和成分下,所有位错相互作用都会导致螺纹段被阻塞。仅当两个位错具有平行的Burgers向量时,才会停止高于一定厚度和成分的位错运动。这是由于位错之间发生的特殊反应所致。在存在界面段应力场的情况下,对螺纹位错的动态运动进行定量分析可以提取长程相互作用应力的大小。可以看出,相互作用应力的大小随表层中净多余应力的增加而增加,并且当Burgers向量平行时,相互作用应力要大得多。最后,另外的实验表明,在退火过程中被阻塞的位错形成了相对稳定的构型。在阻塞事件之后,需要大于与位错之间的远距离相互作用相关联的力的力,以使位错从其阻塞的配置中释放。这与理论模型形成了鲜明的对比,后者理论上仅由远距离相互作用力控制位错的释放。这些实验代表了应变异质结构中位错相互作用的第一个系统研究,并允许改进这些系统中应变松弛动力学的预测模型。 [参考:51]

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