首页> 外文期刊>Surface review and letters >EFFECT OF THE C2H2 AND N-2 FLOW RATE ON NANOCOMPOSITE nc-ZrCN/a-C:H(N) FILM SYNTHESIZED BY FILTERED CATHODIC VACUUM ARC TECHNIQUE
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EFFECT OF THE C2H2 AND N-2 FLOW RATE ON NANOCOMPOSITE nc-ZrCN/a-C:H(N) FILM SYNTHESIZED BY FILTERED CATHODIC VACUUM ARC TECHNIQUE

机译:C2H2和N-2流量对过滤阴极真空弧技术合成纳米复合nc-ZrCN / a-C:H(N)膜的影响

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摘要

Nanocomposite nc-ZrCN/a-C:H(N) films were prepared by filtered cathodic vacuum arc technique using the C2H2 and N-2 gas as the precursor. The effect of the C2H2 and N-2 flow rate on the microstructure, internal stress, phase composition, and mechanical properties of nanocomposite nc-ZrCN/a-C:H(N) films has been investigated by glancing incidence X-ray diffraction (GIXRD), surface profiler, and X-ray photoelectron spectroscopy(XPS). It was revealed that the C2H2 and N-2 flow rate affected the structure, Zr content, and internal stress of the films significantly. Furthermore, XRD pattern indicated the presence of the ZrCN crystalline grains in the range of 3-10 nm, and the deconvolution results for XPS spectra showed that the film mainly was constituted by Zr-C, C=C(sp2) and C-C(sp3) bonds.
机译:利用C2H2和N-2气体作为前驱体,通过过滤阴极真空电弧技术制备了纳米复合nc-ZrCN / a-C:H(N)薄膜。通过掠入射X射线衍射(GIXRD)研究了C2H2和N-2流速对纳米复合nc-ZrCN / aC:H(N)膜的微观结构,内应力,相组成和力学性能的影响。 ,表面轮廓仪和X射线光电子能谱(XPS)。结果表明,C2H2和N-2流量显着影响薄膜的结构,Zr含量和内应力。此外,XRD图谱表明在3-10 nm范围内存在ZrCN晶粒,XPS光谱的解卷积结果表明该膜主要由Zr-C,C = C(sp2)和CC(sp3)组成)债券。

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