磁过滤直流真空阴极弧制备含铬类金刚石膜的结构及其性能研究

摘要

采用磁过滤直流真空阴极弧沉积技术在单晶硅片、载玻片、不锈钢片基体上制备了含铬类金刚石(Cr-DLC)膜.用光学显微镜、椭偏仪、分光光度计、X射线光电子能谱(XPS)、X射线衍射能谱(XRD)、Raman光谱、纳米硬度计、摩擦磨损仪、洛氏硬度计检测了薄膜的组分结构、光学、力学等相关特性.结果表明,硅片上的薄膜厚度为47.6nm,碳含量为89%,s p~3键占碳含量的55.15%.不锈钢片上的薄膜具有典型的DLC膜Raman光谱特征,在空气中的摩擦系数约为0.1,耐磨性能优良,膜与基体的结合性能良好.%Cr-containing hydrogenated diamond-like carbon (Cr-DLC) films were deposited on stainless steel plate, monocrystalline silicon wafer and microscope slide glass by DC filtered cathodic vacuum arc technology. The composition, structure and properties of Cr-DLC films were investigated by spec-troscopic ellipsometer, X-ray photoelectron spectroscopy(XPS), powder X-ray diffraction(XRD), spectrophotometer, Raman spectroscopy, nanoindenter, ball-on-disk tribometer, Rockwell apparatus and optical microscope. It was shown that the content of C is 89% in the film deposited on silicon wa-fer and the content of sp~3 bonding carbon atoms in the C element is 55.15%. The Raman spectra of the film deposited on stainless steel plate has the typical characteristics of DLC. The hardness and elastic modulus of the film deposited on stainless steel plate are 16.01 GPa and 142.72 GPa. The fric-tion coefficient of the film deposited on stainless steel plate is about 0.1, the film also exhibits excel-lent wear resistance and the adhesion to substrate is very well.