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首页> 外文期刊>Soldering & Surface Mount Technology >Enhanced solder wettability of oxidized-copper with lead-free solder via Ar-H_2 plasmas for flip-chip bumping: the effects of H_2 flow rates
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Enhanced solder wettability of oxidized-copper with lead-free solder via Ar-H_2 plasmas for flip-chip bumping: the effects of H_2 flow rates

机译:通过Ar-H_2等离子体增强无铅焊料对氧化铜的焊料润湿性:倒装芯片凸点:H_2流速的影响

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Purpose - The purpose of this paper is to investigate the effects of H_2 flow rate on improving the solder wettability of oxidized-copper with liquid lead-free solder (96.5Sn-3Ag-0.5Cu) by Ar-H_2 plasmas. The aim was to improve the solder wettability of oxidized copper from 0 per cent wetting of copper oxidized in air at 260℃ for 1 hour to 100 per cent wetting of oxidized-copper modified by Ar-H_2 plasmas at certain H_2 flow rates and to find correlations between the surface characteristics of copper and the solder wettability with liquid lead-free solder. Design/methodology/approach - To reduce the copper oxides on the surfaces of oxidized-copper for improving solder wettability with liquid leadfree solder, this study attempted to apply Ar-H_2 plasmas to ablate the copper oxides from the surfaces of oxidized-copper by the physical bombardment of the Ar plasmas and to reduce the surfaces of oxidized-copper by the chemical reaction of H_2 plasmas with the surfaces of oxidized-copper. Findings - The solder wettability of oxidized-copper was found to be highly dependent on the surface characteristics of the copper. The values of polar surface free energy and dispersive surface free energy on the surfaces of oxidized-copper modified by Ar-H_2 plasmas were close to those values of solid lead-free solder, which resulted in improved solder wettability with liquid lead-free solder. Auger spectra indicated that the Ar-H_2 plasma modification was used to remove the copper oxides from the surfaces of oxidized-copper. Originality/value - The surface characterization of copper surfaces is typically determined by expensive surface analysis tool such as Auger Electron Spectroscopy (AES). This paper reports the results of a study of a promising technique called the sessile drop test method, for examining the surface free energies such as total surface free energy, polar surface free energy and dispersive surface free energy on the surfaces of copper to clarify how the solder wettability of oxidized-copper with liquid lead-free solder was enhanced by Ar-H_2 plasmas.
机译:目的-本文的目的是研究H_2流速对通过Ar-H_2等离子体提高液态无铅焊料(96.5Sn-3Ag-0.5Cu)对氧化铜的焊料润湿性的影响。目的是将氧化铜的焊料润湿性从在260℃空气中氧化1小时的铜的0%润湿度提高到在某些H_2流速下由Ar-H_2等离子体改性的氧化铜的100%润湿性并找到铜的表面特性与液态无铅焊料的润湿性之间的相关性。设计/方法/方法-为了减少氧化铜表面上的氧化铜,以提高液态无铅焊料的润湿性,本研究尝试使用Ar-H_2等离子体,通过氧化铜从氧化铜表面烧蚀掉氧化铜。通过H_2等离子体与氧化铜表面的化学反应对Ar等离子体进行物理轰击并还原氧化铜表面。发现-氧化铜的焊料润湿性高度依赖于铜的表面特性。 Ar-H_2等离子体改性的氧化铜表面的极性表面自由能和分散表面自由能的值接近于固态无铅焊料的值,从而提高了液态无铅焊料的焊料润湿性。俄歇光谱表明,使用Ar-H_2等离子体改性可从氧化铜表面去除氧化铜。原创性/价值-铜表面的表面特征通常由昂贵的表面分析工具(例如俄歇电子能谱(AES))确定。本文报告了一项研究的成果,该技术被称为固着跌落测试法,用于检查铜表面上的表面自由能,例如总表面自由能,极性表面自由能和分散表面自由能,以阐明Ar-H_2等离子体提高了氧化铜与液态无铅焊料的焊料润湿性。

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