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Observation of possible quantum interference effects in SrRuO_3 epitaxial thin films grown by high-oxygen pressure dc sputtering

机译:高氧压直流溅射生长SrRuO_3外延薄膜中可能的量子干涉效应的观察

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摘要

A careful study of the electronic transport and magnetotransport properties of metallic ferromagnetic SrRuO_3 (SRO) thin films is reported. Epitaxial (approx 150 nm) SRO films were grown on (001 )-oriented SrTiO_3 (STO) substrates by dc sputtering technique at high oxygen pressure. Resistivity measurements were performed up to temperatures as low as 2 K in magnetic fields strengths of up to 9T, applied perpen-dicular to the film plane. The films featured excellent metallic behavior at room temperature, with a resistivity, p(300 K) < 600 mu Ω cm. The presence of minima in the p-T plots at approx 4K was clearly detected from these measurements. The 9 T magnetic field did not remove the minima signaling its nonmagnetic origin In addition, the p(mu_oH = 9 T,T) minima was slightly shifted to higher temperature and the p(mu_oH = 9 T,T < 4 K) was larger when it was compared with p(mu_oH = 0 T,T < 4 K). Increasing relevance of quantum corrections to the conductivity as the temperature is lowered has been invocated as possible cause of this anomalous electrical behavior. In this case, effects arising from quantum interference of the electronic wavelength are expected. Weak localization and renormalized electron-electron interaction have been considered as possible sources giving rise to quantum correction to the conductivity.
机译:报告了对金属铁磁SrRuO_3(SRO)薄膜的电子输运和磁输运性质的仔细研究。通过直流溅射技术在高氧气压力下在(001)取向的SrTiO_3(STO)衬底上生长外延(约150 nm)SRO膜。在垂直于薄膜平面施加的高达9T的磁场强度下,进行了高达2T的温度下的电阻率测量。这些薄膜在室温下具有出色的金属性能,其电阻率p(300 K)<600μΩcm。从这些测量清楚地检测到在大约4K的p-T图中存在最小值。 9 T磁场并未消除表示其非磁性起源的极小值。此外,p(mu_oH = 9 T,T)极小值略微移至更高的温度,而p(mu_oH = 9 T,T <4 K)较大与p(mu_oH = 0 T,T <4 K)进行比较时。人们认为,随着温度的降低,量子校正与电导率的相关性越来越高,这可能是导致这种异常电学行为的原因。在这种情况下,期望由电子波长的量子干涉引起的效果。弱的定位和重新规范化的电子-电子相互作用被认为是引起电导率量子校正的可能来源。

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