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Investigation of the optical properties of GaAs with delta-Si doping grown by molecular-beam epitaxy at low temperatures

机译:低温下分子束外延生长δ-Si掺杂GaAs的光学性质研究

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摘要

Molecular-beam epitaxy is used for the preparation of structures based on "low-temperature" grown GaAs with introduced d-Si doping. Specific features in the photon-energy range of 1.28-1.48 eV are observed in the photoluminescence spectrum after structures annealing at temperatures of 520 and 580A degrees C; these features are related to the formation of point defects and their complexes. The "pump-probe" light transmission measurements reveal that the characteristic lifetimes of nonequilibrium carriers in the fabricated structures amount to T-c a parts per thousand 1.2-1.5 ps.
机译:分子束外延用于制备基于“低温”生长GaAs并引入d-Si掺杂的结构。在520和580A的温度下进行结构退火后,在光致发光光谱中观察到的光子能量范围为1.28-1.48 eV。这些特征与点缺陷及其复合物的形成有关。 “泵浦式”光透射测量结果显示,在制造的结构中,非平衡载流子的特征寿命总计为T-c a千分之1.2-1.5 ps。

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