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Characteristics of InGaP/InGaAs pseudomorphic high electron mobility transistors with triple delta-doped sheets

机译:具有三重三角形掺杂片的InGaP / InGaAs伪形高电子迁移率晶体管的特性

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摘要

Fundamental and insightful characteristics of InGaP/InGaAs double channel pseudomorphic high electron mobility transistors (DCPHEMTs) with graded and uniform triple δ-doped sheets are coomprehensively studied and demonstrated. To gain physical insight, band diagrams, carrier densities, and direct current characteristics of devices are compared and investigated based on the 2D semiconductor simulator, Atlas. Due to uniform carrier distribution and high electron density in the double InGaAs channel, the DCPHEMT with graded triple δ-doped sheets exhibits better transport properties, higher and linear transconductance, and better drain current capability as compared with the uniformly triple δ-doped counterpart. The DCPHEMT with graded triple δ-doped structure is fabricated and tested, and the experimental data are found to be in good agreement with simulated results.
机译:全面地研究和证明了具有梯度和均匀三重δ掺杂片的InGaP / InGaAs双通道假晶高电子迁移率晶体管(DCPHEMT)的基本和深刻的特性。为了获得物理洞察力,基于2D半导体模拟器Atlas对设备的能带图,载流子密度和直流特性进行了比较和研究。由于在双InGaAs沟道中均匀的载流子分布和高电子密度,与均匀掺杂三重δ的掺杂物相比,具有梯度掺杂三重δ的片材的DCPHEMT表现出更好的传输性能,更高和线性的跨导以及更好的漏极电流性能。制备并测试了具有梯度三δ掺杂结构的DCPHEMT,实验数据与模拟结果吻合良好。

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