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首页> 外文期刊>Semiconductors >Effect of Irradiation with Fast Neutrons on Electrical Characteristics of Devices Based on CVD 4H-SiC Epitaxial Layers
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Effect of Irradiation with Fast Neutrons on Electrical Characteristics of Devices Based on CVD 4H-SiC Epitaxial Layers

机译:快中子辐照对基于CVD 4H-SiC外延层的器件电学特性的影响

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摘要

The effect of irradiation with 1-MeV neutrons on electrical properties of Al-based Schottky barriers and p~+-n-n~+ diodes doped by ion-implantation with Al was studied; the devices were formed on the basis of high-resistivity, pure 4H-SiC epitaxial layers possessing n-type conductivity and grown by vapor-transport epitaxy. The use of such structures made it possible to study the radiation defects in the epitaxial layer at temperatures as high as 700 K. Rectifying properties of the diode structures were no longer observed after irradiation of the samples with neutrons with a dose of 6 * 10~(14) cm~(-2); this effect is caused by high (up to 50GΩ) resistance of the layer damaged by neutron radiation. However, the diode characteristics of irradiated p~+-n-n~+ structures were partially recovered after an annealing at 650 K.
机译:研究了1-MeV中子辐照对Al离子注入Al基肖特基势垒和p〜+ -n-n〜+二极管的电学性能的影响。该器件是在具有高电阻率的纯4H-SiC外延层的基础上形成的,该外延层具有n型导电性并通过气相传输外延生长。通过使用这种结构,可以研究在高达700 K的温度下外延层中的辐射缺陷。用6 * 10〜的中子辐照样品后,不再观察到二极管结构的整流特性。 (14)厘米〜(-2);这种影响是由中子辐射损坏的层的高电阻(高达50GΩ)引起的。然而,在650 K退火后,已辐射的p〜+ -n-n〜+结构的二极管特性得以部分恢复。

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