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Effect of growth temperature on properties of transparent conducting gallium-doped ZnO films

机译:生长温度对透明导电镓掺杂ZnO薄膜性能的影响

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摘要

Transparent conducting gallium-doped ZnO films are deposited on glass substrates by magnetron sputtering of conducting ceramic targets. The dependences of structural, electric, and optical characteristics of ZnO:Ga films on the substrate temperature are investigated during the deposition. Stability of resistivity of films is considered during annealing in air. It is found that the films deposited at the substrate temperature of 250°C have the lowest resistivity of 3.8 × 10~(-4) Ω cm, while those deposited at 200°C have the highest thermal stability.
机译:透明导电镓掺杂ZnO薄膜通过磁控管溅射陶瓷靶而沉积在玻璃基板上。在沉积过程中研究了ZnO:Ga膜的结构,电学和光学特性对衬底温度的依赖性。在空气中退火期间考虑了膜的电阻率的稳定性。发现在250°C的衬底温度下沉积的膜的电阻率最低,为3.8×10〜(-4)Ωcm,而在200°C的条件下沉积的膜具有最高的热稳定性。

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