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Cathodoluminescence investigation of silicon nanowires fabricated by thermal evaporation of SiO

机译:SiO热蒸发制备的硅纳米线的阴极发光研究

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摘要

Silicon nanowire samples fabricated by thermal evaporation of SiO powder were investigated by Cathodoluminescence. Three main bands were found at low temperatures, namely, peak 1 at about 620-650 nm (2.0-1.91 eV), peak 2 at 920 nm (1.35 eV), and peak 3 at 1280 nm (0.97 eV). An additional broad band (peak 4) in the infrared region with its maximum at similar to 1570 nm (0.79 eV) appears at room temperature. The origins of the emission bands are discussed.
机译:通过阴极发光研究了通过SiO粉热蒸发制备的硅纳米线样品。在低温下发现三个主要谱带,即在约620-650 nm(2.0-1.91 eV)处的峰1,在920 nm(1.35 eV)处的峰2和在1280 nm(0.97 eV)处的峰3。在室温下,在红外区域出现了另一个宽带(峰4),其最大值类似于1570 nm(0.79 eV)。讨论了发射带的起源。

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