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首页> 外文期刊>Sensors and Actuators, A. Physical >Lead-free 0.75(Bi0.5Na0.5)TiO3-0.25SrTiO(3) (BNT-ST) epitaxial films grown on Si (001) substrates via pulsed laser deposition
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Lead-free 0.75(Bi0.5Na0.5)TiO3-0.25SrTiO(3) (BNT-ST) epitaxial films grown on Si (001) substrates via pulsed laser deposition

机译:通过脉冲激光沉积在Si(001)衬底上生长的无铅0.75(Bi0.5Na0.5)TiO3-0.25SrTiO(3)(BNT-ST)外延膜

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摘要

Lead-free BNT-ST and La0.5Ni0.5O3 (LNO) bottom electrode films were epitaxially grown onto CeO2/YSZ (yttria stabilized zirconia) buffered Si (001) substrates via pulsed laser deposition. The lattice alignment of CeO2/YSZ and BNT-ST/LNO showed 45 degrees twisted cube-on-cube epitaxial relationship, indicating high crystallinity for the BNT-ST and LNO films. The constituent elements in the BNT-ST/LNO/CeO2/YSZ structure showed no distinct diffusion between the layers. The BNT-ST epitaxial films demonstrated ferroelectric properties, but exhibited a high degree of leakage current density. (C) 2016 Elsevier B.V. All rights reserved.
机译:通过脉冲激光沉积将无铅BNT-ST和La0.5Ni0.5O3(LNO)底部电极膜外延生长在CeO2 / YSZ(氧化钇稳定的氧化锆)缓冲的Si(001)衬底上。 CeO2 / YSZ和BNT-ST / LNO的晶格排列显示出45度扭曲的立方对立方外延关系,表明BNT-ST和LNO薄膜具有高结晶度。 BNT-ST / LNO / CeO2 / YSZ结构中的构成元素在层之间没有显示出明显的扩散。 BNT-ST外延膜显示出铁电特性,但表现出高度的漏电流密度。 (C)2016 Elsevier B.V.保留所有权利。

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