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首页> 外文期刊>Physica status solidi >Microwave dielectric properties of pure and Mn-doped lead-free Na_(0.5)Bi_(0.5)TiO_3 epitaxial thin films grown on (001) LaAlO_3 single crystals using pulsed laser deposition
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Microwave dielectric properties of pure and Mn-doped lead-free Na_(0.5)Bi_(0.5)TiO_3 epitaxial thin films grown on (001) LaAlO_3 single crystals using pulsed laser deposition

机译:使用脉冲激光沉积在(001)LaAlO_3单晶上生长的纯锰掺杂无铅Na_(0.5)Bi_(0.5)TiO_3外延薄膜的微波介电性能

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摘要

(001)-cpilaxial thin films of pure and Mn-doped lead-free Na_(0.5)Bi_(0.5)TiO_3 (NBT) were grown on (001) LaAlO_3 single crystals, by pulsed laser deposition. The determination of the microwave dielectric permittivity, from interdigitated capacitance values treated using the combination of two previously-developed analytical models, constitutes the backbone of this work. In the 3-5 GHz frequency range, constant ε_r values of ~485 and ~515 for the pure and Mn-doped layers, respectively, were extracted and found in good agreement with literature data for pure NBT bulk ceramics, thus underlining the relevance of the approach. These permittivity values were re-injected in a second step into an electromagnetic simulation of the equivalent electrical circuit. Smith charts revealed the good matching between experimental and simulated data, proving that the employed method appears meaningful. Mn doping seems to lead to a small permittivity increase and clearly to a moderate reduction of the dielectric losses in the 3-5 GHz interval. Finally, the variation of the capacitance versus temperature testifies to the ferroelectric nature of the samples.
机译:通过脉冲激光沉积在(001)LaAlO_3单晶上生长(001)纯净且掺杂Mn的无铅Na_(0.5)Bi_(0.5)TiO_3(NBT)绕线薄膜。通过使用两个以前开发的分析模型组合处理的叉指电容值确定微波介电常数,是这项工作的基础。在3-5 GHz频率范围内,分别提取了纯掺杂层和Mn掺杂层的恒定ε_r值分别为〜485和〜515,并与纯NBT块状陶瓷的文献数据非常吻合,从而突显了该方法。在第二步骤中将这些介电常数值重新注入等效电路的电磁模拟中。史密斯圆图揭示了实验数据和模拟数据之间的良好匹配,证明了所采用的方法显得有意义。 Mn掺杂似乎会导致介电常数小幅增加,并且显然会导致3-5 GHz间隔中介电损耗的适度降低。最后,电容随温度的变化证明了样品的铁电特性。

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  • 来源
    《Physica status solidi》 |2016年第12期|3221-3230|共10页
  • 作者单位

    Laboratoire Science des Precedes Ceramiques et de Traitements de Surface, UMR 7315 CNRS, Universite de Limoges, Centre Europeen de la Ceramique, 12, rue Atlantis, 87068 Limoges Cedex, France,Universite Francois Rabelais de Tours, CNRS, CEA, INSA CVL, GREMAN UMR 7347, IUT de Blois, 15 rue de la chocolaterie, CS 2903, 41029 Blois Cedex, France;

    Institut XLIM, UMR 7252 CNRS, Universite de Limoges, 123, avenue Albert Thomas, 87060 Limoges Cedex, France;

    Institut XLIM, UMR 7252 CNRS, Universite de Limoges, 123, avenue Albert Thomas, 87060 Limoges Cedex, France;

    Institut XLIM, UMR 7252 CNRS, Universite de Limoges, 123, avenue Albert Thomas, 87060 Limoges Cedex, France;

    Laboratoire Science des Precedes Ceramiques et de Traitements de Surface, UMR 7315 CNRS, Universite de Limoges, Centre Europeen de la Ceramique, 12, rue Atlantis, 87068 Limoges Cedex, France;

    Laboratoire Science des Precedes Ceramiques et de Traitements de Surface, UMR 7315 CNRS, Universite de Limoges, Centre Europeen de la Ceramique, 12, rue Atlantis, 87068 Limoges Cedex, France;

    Laboratoire Science des Precedes Ceramiques et de Traitements de Surface, UMR 7315 CNRS, Universite de Limoges, Centre Europeen de la Ceramique, 12, rue Atlantis, 87068 Limoges Cedex, France;

    Institut des Sciences Chimiques de Rennes, UMR 6226 CNRS, Universite de Rennes 1, Campus de Beaulieu, 35042 Rennes Cedex, France;

    Institut XLIM, UMR 7252 CNRS, Universite de Limoges, 123, avenue Albert Thomas, 87060 Limoges Cedex, France;

    Institut XLIM, UMR 7252 CNRS, Universite de Limoges, 123, avenue Albert Thomas, 87060 Limoges Cedex, France;

    Institut XLIM, UMR 7252 CNRS, Universite de Limoges, 123, avenue Albert Thomas, 87060 Limoges Cedex, France;

    Institut des Sciences Chimiques de Rennes, UMR 6226 CNRS, Universite de Rennes 1, Campus de Beaulieu, 35042 Rennes Cedex, France;

    Laboratoire Science des Precedes Ceramiques et de Traitements de Surface, UMR 7315 CNRS, Universite de Limoges, Centre Europeen de la Ceramique, 12, rue Atlantis, 87068 Limoges Cedex, France;

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  • 正文语种 eng
  • 中图分类
  • 关键词

    dielectric properties; doping; lead-free ferroelectrics; Na_(0.5)Bi_(0.5)TiO_3; pulsed laser deposition; thin films;

    机译:介电性能掺杂无铅铁电体;Na_(0.5)Bi_(0.5)TiO_3;脉冲激光沉积薄膜;

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