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Process for the epitaxial deposition of thin films of pseudo-binary single-crystalline semiconductor material on single-crystalline substrates
Process for the epitaxial deposition of thin films of pseudo-binary single-crystalline semiconductor material on single-crystalline substrates
The essence of the invention is that the substrate is immersed in a solution containing the components of the layer to be deposited, the solution being thoroughly mixed at least before the immersion of the substrate. IMAGE
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