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Titanium tellurite thick films prepared by electrophoretic deposition and their dielectric properties

机译:电泳沉积法制备的碲化钛厚膜及其介电性能

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TiTe_3O_8 ceramics and films can be well sintered below 800 deg C and consequently have the potential to be used for low-temperature co-fired ceramics. TiTe_3O_8thick films were fabricated by electrophoretic deposition on platinized Si substrates using TiTe_3O_8 powders synthesized by a conventional solid-state reaction. The permittivity of TiTe_3O_8 films is approx 54, with loss tan deta of approx 0.009, measured at 100 kHz. The temperature coefficients of permittivity of TiTe_3O_8 films and ceramics between 35 and 200 deg C are +78 and — 100 ppm deg C~(-1), respectively.
机译:TiTe_3O_8陶瓷和薄膜可以在800摄氏度以下很好地烧结,因此有潜力用于低温共烧陶瓷。通过在传统的固态反应中合成的TiTe_3O_8粉末,通过电泳沉积在镀铂的Si基板上来制备TiTe_3O_8厚膜。 TiTe_3O_8薄膜的介电常数约为54,在100 kHz下测得的损耗tan deta约为0.009。 TiTe_3O_8薄膜和陶瓷的介电常数在35至200摄氏度之间的温度系数分别为+78和-100 ppm摄氏度(-1)。

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