Microstructural evolution and optical properties of doped TiO_2 films prepared by RF magnetron sputtering

摘要

In this study, Y_2O_3 and Nb_2O_5doped titanium dioxide (TiO_2) films on glass substrate were prepared using RF magnetron sputtering. The effects of dopants on the microstrucutral evolution and optical properties of TiO_2 films were investigated. The as-deposited films are amorphous, irrespective of films containing Nb_2O_5 or Y_2O_3. After annealing at 400 deg C and above in pure oxygen, anatase phase was obtained for pure TiO_2 and Nb_2O_5doped TiO_2 films. Y_2O_3 dopant retards the crystallization to a higher temperature. After annealing, the transmittance of the TiO_2 film is increased by Nb_2O_5 or Y_2O_3addition. The higher transmittance of the doped samples can be correlated with their surface roughness.