Optimization of radio frequency inductively coupled plasma enhanced chemical vapour deposition process of diamond-like carbon films

摘要

The diamond-like carbon materials have unique mechanical, optical, electrical and chemical properties. The material is commonly applied in automotive industry, medicine and in other everyday life products. However, the diamond-like carbons are not used in micro- and optoelectronics on a wider scale due to technological problems. The application of the diamond-like carbon films in electronic structure is limited because the standard methods do not ensure that the quality and properties of the deposited film will be satisfactory for a specific application. On the other hand, more sophisticated methods that allow manufacturing the diamond-like carbon film with adequate properties, such as microwave assisted chemical vapour deposition, require heating of the substrate to high temperature (above 1000 degrees C). The solution to the problem is the radio frequency inductively coupled plasma enhanced chemical vapour deposition method that allows deposition of the diamond-like carbon films with satisfactory properties and the process can be carried out at room temperature. In the paper, basic information and issues concerning the diamond-like carbon films manufacturing technology by radio frequency inductively coupled plasma enhanced chemical vapour deposition method will be explained. The diamond-like carbon films were investigated by the Raman scattering spectroscopy and the spectroscopic ellipsometry.