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CO_2 gas sensing properties of DC reactive magnetron sputtered ZnO thin film

机译:直流反应磁控溅射ZnO薄膜的CO_2气敏特性

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Nanostructured ZnO thin films were deposited on glass substrates using a DC reactive magnetron sputtering technique. Thin films of three different thicknesses viz 40, 100 and 300 nm were prepared and subsequently annealed at 450 °C. The structural, topographical, and optical characteristics of all the three annealed films were studied using X-ray diffractometer (XRD), Atomic Force Microscope (AFM) UV-visible and photoluminescence spectrophotometers. The carbon dioxide (CO_2) gas sensing behavior of these films was investigated in detail in the concentration range of 500-10,000 ppm. The sensing performance was optimized with respect to the ZnO film thickness as well as the operating temperature. ZnO film with 40 nm thickness showed better response characteristics at the operating temperature of 300 °C than that of thicker ZnO films. A maximum sensitivity (%) of 1.13 with a response and recovery time of 20 s was observed towards 1000 ppm of CO_2.
机译:使用直流反应磁控溅射技术在玻璃基板上沉积纳米结构的ZnO薄膜。制备三种不同厚度的薄膜,分别为40、100和300 nm,然后在450°C退火。使用X射线衍射仪(XRD),原子力显微镜(AFM)紫外可见光和光致发光分光光度计研究了所有三种退火膜的结构,形貌和光学特性。在500-10,000 ppm的浓度范围内,对这些薄膜的二氧化碳(CO_2)气体感测行为进行了详细研究。在ZnO膜厚度以及工作温度方面优化了感测性能。厚度为40 nm的ZnO膜在300°C的工作温度下表现出比较厚的ZnO膜更好的响应特性。观察到1000 ppm CO_2的最大灵敏度(%)为1.13,响应和恢复时间为20 s。

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