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Effect of Temperature on Processes of Radiation-Induced Generation of Primary Defects in MgF_2 Crystals

机译:温度对MgF_2晶体中辐射诱导的原始缺陷生成过程的影响

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The spectral and kinetic parameters of the absorption and emission relaxation initiated by a single nanosecond-range electron pulse in MgF_2 crystals are studied in the temperature range 20-550 K. It is found that the relationship between the two channels of dissipation of the electronic excitation energy (generation of F centers and short-lived excitons) does not depend on the temperature of the irradiated crystal in the temperature range 20-120 K and changes in favor of the F centers at T ≥ 150 K. The temperature quenching of the 3.2-eV exciton emission at T ≥ 60 K is detected. The ionic structure of the short-lived excitonic state is discussed.
机译:研究了在20-550 K的温度范围内由单个纳秒级电子脉冲在MgF_2晶体中引发的吸收和发射弛豫的光谱和动力学参数。发现电子激发的两个耗散通道之间​​的关系能量(F中心和短寿命激子的产生)不依赖于在20-120 K温度范围内受辐照晶体的温度,并且在T≥150 K时有利于F中心发生变化。3.2的温度猝灭在T≥60 K时检测到-eV激子发射。讨论了短时激子态的离子结构。

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