首页> 外文期刊>Optik: Zeitschrift fur Licht- und Elektronenoptik: = Journal for Light-and Electronoptic >Investigation in the interface roughness of DC-sputtered Mo/B_4C multilayer mirrors with variable layer pairs for 7-nm soft X-ray polarizers
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Investigation in the interface roughness of DC-sputtered Mo/B_4C multilayer mirrors with variable layer pairs for 7-nm soft X-ray polarizers

机译:可变厚度对的直流溅射Mo / B_4C多层反射镜的界面粗糙度的研究,用于7 nm软X射线偏振器

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摘要

The surface and interface roughness of Mo/B_4C multilayer mirrors for 7-nm soft X-ray polarizer with variable layer pairs (N= 50, 70, 90 and 110), fabricated by DC sputtering technique is investigated by atomic force microscopy and X-ray scattering and reflecting. The experimental results present that the surface and interface roughness of Mo/B_4C multilayer mirrors increase layer by layer from its substrate as its Mo layer thickness greater than 2 nm, and the roughness grown tendency could be characterized by a quadratic function.
机译:通过原子力显微镜和X射线衍射技术研究了DC溅射技术制备的具有可变层对(N = 50、70、90和110)的7纳米软X射线偏振器的Mo / B_4C多层反射镜的表面和界面粗糙度。射线散射和反射。实验结果表明,当Mo / B_4C多层反射镜的Mo层厚度大于2 nm时,其表面和界面粗糙度从其基底层开始逐层增大,并且粗糙度的增长趋势可以用二次函数来表征。

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