首页> 外文期刊>Optics & Laser Technology >Gain and threshold properties of InGaAsN/GaAsN material system for 1.3-mu m semiconductor lasers
【24h】

Gain and threshold properties of InGaAsN/GaAsN material system for 1.3-mu m semiconductor lasers

机译:用于1.3微米半导体激光器的InGaAsN / GaAsN材料系统的增益和阈值特性

获取原文
获取原文并翻译 | 示例
获取外文期刊封面目录资料

摘要

The gain properties and valence subbands of InGaAsN/GaAsN quantum-well structures are numerically investigated with a self-consistent LASTIP simulation program. The simulation results show that the InGaAsN/GaAsN has lower transparency carrier density than the conventional InGaAsP/InP material system for 1.3-mu m semiconductor lasers. The material gain and radiative current density of InGaAsN/GaAsN with different compressive strains in quantum well and tensile strains in barrier are also studied. The material gain and radiative current density as functions of strain in quantum well and barrier are determined. The simulation results suggest that the laser performance and Auger recombination rate of the 1.3-mu m InGaAsN semiconductor laser may be markedly improved when the traditional GaAs barriers are replaced with the AlGaAs graded barriers. (c) 2006 Elsevier Ltd. All rights reserved.
机译:利用自洽的LASTIP仿真程序对InGaAsN / GaAsN量子阱结构的增益特性和价子带进行了数值研究。仿真结果表明,对于1.3微米的半导体激光器,InGaAsN / GaAsN具有比常规InGaAsP / InP材料系统更低的透明载流子密度。研究了量子阱中不同压缩应变和势垒中拉伸应变的InGaAsN / GaAsN的材料增益和辐射电流密度。确定了材料增益和辐射电流密度作为量子阱和势垒中应变的函数。仿真结果表明,当用AlGaAs梯度阻挡层代替传统的GaAs阻挡层时,可以显着改善1.3微米InGaAsN半导体激光器的激光器性能和俄歇复合率。 (c)2006 Elsevier Ltd.保留所有权利。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号