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首页> 外文期刊>RSC Advances >Intrinsic defects in gallium sulfide monolayer: a first-principles study
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Intrinsic defects in gallium sulfide monolayer: a first-principles study

机译:硫化镓单层的内在缺陷:第一性原理研究

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The electronic and magnetic properties of native point defects, including vacancies (V-Ga and V-S), antisites (Ga-S and S-Ga) and interstitials (Ga-i and S-i) in monolayer and bulk GaS, were systemically studied using the density functional theory method. For the monolayer, the impurity states appeared in the band gaps of all defect structures except interstitial S-i. Half-metallic behavior can be obtained in the presence of V-Ga and Ga-i. Monolayers with V-Ga, Ga-S, S-Ga and Ga-i had a total magnetic moment of 1.0 mu(B), as did the bulk samples with V-Ga, Ga-S and S-Ga, whereas the monolayers with V-S and S-i and bulk sample with Ga-i were spin-unpolarized. In addition, n- and p-type GaS monolayers were obtained under Ga-rich and S-rich conditions, respectively. Ga-S and S-Ga were identified as suitable n- and p-type defects, respectively.
机译:通过使用密度泛函理论方法。对于单层,杂质状态出现在除间隙S-i之外的所有缺陷结构的带隙中。在V-Ga和Ga-i的存在下可以获得半金属行为。具有V-Ga,Ga-S,S-Ga和Ga-i的单层的总磁矩为1.0μ(B),具有V-Ga,Ga-S和S-Ga的本体样品的总磁矩也为1.0μ(B)。用VS和Si制成的样品以及用Ga-i制成的大量样品自旋未极化。另外,分别在富Ga和富S条件下获得n型和p型GaS单层。将Ga-S和S-Ga分别确定为合适的n型和p型缺陷。

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