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首页> 外文期刊>Radiation measurements >The dependence of thermoluminescence of LiF:Mg,Cu,Si on sintering temperatures and dopants concentrations
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The dependence of thermoluminescence of LiF:Mg,Cu,Si on sintering temperatures and dopants concentrations

机译:LiF:Mg,Cu,Si的热致发光与烧结温度和掺杂剂浓度的关系

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摘要

The dependence of thermoluminescence (TL) of LiF:Mg,Cu,Si on sintering temperatures and dopants concentrations were investigated. The dependency of the TL in LiF:Mg,Cu,Si on sintering temperature exhibits a very sharp maximum at 830 °C. LiF:Mg,Cu,Si is much too sensitive than LiF:Mg,Cu,P to sintering temperature. The glow curve and the TL sensitivity depend on the concentration of Mg, Cu and Si, showing a distinct maximum for certain concentrations of these impurities. Mg seems to be the most essential dopant, as very small changes of the Mg content strongly influence both the glow curve and the TL sensitivity. Si is the main activator responsible for TL emission. The stability to heat treatments in LiF:Mg,Cu,Si was influenced greatly by Mg concentrations. The thermal instability in LiF:Mg,Cu,Si is caused not by Cu and Si but Mg ion state change. It was found that the optimum concentrations are Mg:0.6 mol%, Cu:0.03 mol% and Si:0.9 mol% for this material, which showed the best stability to heat treatment.
机译:研究了LiF:Mg,Cu,Si的热致发光(TL)对烧结温度和掺杂剂浓度的依赖性。 LiF:Mg,Cu,Si中TL对烧结温度的依赖性在830°C时显示出非常尖锐的最大值。 LiF:Mg,Cu,Si对LiF:Mg,Cu,P的烧结温度过于敏感。辉光曲线和TL灵敏度取决于Mg,Cu和Si的浓度,在这些杂质的某些浓度下显示出明显的最大值。 Mg似乎是最重要的掺杂剂,因为Mg含量的很小变化会强烈影响辉光曲线和TL灵敏度。 Si是负责TL发射的主要活化剂。 LiF:Mg,Cu,Si对热处理的稳定性受Mg浓度的影响很大。 LiF:Mg,Cu,Si中的热不稳定性不是由Cu和Si引起的,而是由Mg离子状态的变化引起的。发现该材料的最佳浓度为Mg:0.6mol%,Cu:0.03mol%和Si:0.9mol%,这显示出对热处理的最佳稳定性。

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