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Surface modified hydroxyapatite thick films for CO2 gas sensing application: Effect of swift heavy ion irradiation

机译:用于CO2气敏应用的表面改性羟基磷灰石厚膜:快速重离子辐照的影响

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摘要

Swift heavy ion irradiation (SHI) is used to modify the structural and gas sensing properties of Hydroxyapatite (HAp) thick films. The HAp thick films, prepared by screen printing technique, are irradiated with a variable fluence (3 x 10~(10) to 3 x 10~(13) ions/cm~2) of Ag~(7+) ions of 100 MeV energy. XRD shows gradual change in crystallinity of the matrix with increase in ion fluence. Atomic force microscopy reveals the agglomeration of grains with pronounced cluster type structure at relatively higher ion fluence. For confirmation of efficient gas sensing of pristine and irradiated HAp thick films, repeatability and reproducibility tests are conducted in a carbon dioxide atmosphere. The parameters responsible for device applications such as, gas uptake capacity, response to test gas and recovery time of HAp film sensor are also investigated. SHI modified HAp films show the maximum enhancement in the gas response and also in increased gas uptake capacity for the fluence 3 x 10~(11) ions/cm~2. Moreover, SHI has resulted in modification of gas response and recovery time for CO2 gas. The remarkable observation is to note that SHI irradiation improves the sensor characteristics of the HAp films without affecting the working temperature (165 °C) of gas sensor.
机译:快速重离子辐照(SHI)用于修饰羟基磷灰石(HAp)厚膜的结构和气敏特性。通过丝网印刷技术制备的HAp厚膜以100 MeV的Ag〜(7+)离子的可变通量(3 x 10〜(10)至3 x 10〜(13)离子/ cm〜2)辐照能源。 XRD显示随着离子通量的增加,基质的结晶度逐渐变化。原子力显微镜揭示了在相对较高的离子通量下具有明显簇状结构的晶粒的团聚。为了确认原始和辐照过的HAp厚膜的有效气敏性,在二氧化碳气氛中进行了重复性和再现性测试。还研究了负责设备应用的参数,例如气体吸收能力,对测试气体的响应以及HAp薄膜传感器的恢复时间。 SHI改性的HAp膜在3 x 10〜(11)离子/ cm〜2的注量下显示出最大的气体响应增强能力和更高的气体吸收能力。而且,SHI导致气体响应和CO2气体回收时间的改变。值得注意的观察结果是,SHI辐照改善了HAp膜的传感器特性,而不影响气体传感器的工作温度(165°C)。

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