Influence of pulse repetition rate on the average size of silicon nanoparticles deposited by laser ablation

摘要

To investigate the influence Of Pulse repetition rate on the average size of the nanoparticles, nanocrystalline Si films were prepared by pulsed laser ablation in high-purity Ar gas with a pressure of 10 Pa at room temperature, under the pulse repetition rates between 1 and 40 Hz, using a nanosecond laser. Raman, X-ray diffraction spectra, and scanning electron microscopy images show that with increasing pulse repetition rate, the average size of the nanoparticles in the film first decreases and reach its minimum at 20 Hz, and then increases, which may be attributed to the nonlinear dynamics of the laser-ablative deposition. In our experiment conditions, the duration of the ambient restoration, a characteristic parameter being used to distinguish nonlinear or linear region, is about a few seconds from the order of magnitude, which is consistent with the previous experimental observation. More detailed model to explain quantitively the observed effect is under investigation.