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首页> 外文期刊>Lasers in engineering >A Comparative Study of Violet InGaN Double Quantum Well Lasers with 1.89 and 0.80 eV InN Bandgap Energies
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A Comparative Study of Violet InGaN Double Quantum Well Lasers with 1.89 and 0.80 eV InN Bandgap Energies

机译:具有1.89和0.80 eV InN带隙能的紫光InGaN双量子阱激光器的比较研究

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摘要

The performance characteristics of violet InGaN double quantum well (DQW) lasers with 1.89 and 0.80 eV bandgap energies have been investigated using the Integrated System Engineering Technical Computer Aided Design (ISE TCAD) software. The basic structure and material parameters used in the model were extracted based on the room temperature continuous wave (CW) operation lasers fabricated by other workers in which the bandgap energy of InN was 1.89 eV and the material parameters of the structure with 0.80 eV InN bandgap energy was based on the latest literature and experimental work. The simulation results demonstrated the different conduction and valence band profile and electron and hole distribution in the active region. The laser structure with 0.80 eV InN bandgap energy has higher performance characteristics such output power, slope efficiency and differential quantum efficiency and lower threshold current compared with the structure with 1.89 eV InN bandgap energy.
机译:使用集成系统工程技术计算机辅助设计(ISE TCAD)软件对具有1.89和0.80 eV带隙能量的InGaN双量子阱(DQW)紫激光的性能进行了研究。该模型中使用的基本结构和材料参数是根据其他工作人员制造的室温连续波(CW)激光器提取的,其中InN的带隙能量为1.89 eV,InN带隙为0.80 eV的结构的材料参数能量是根据最新文献和实验工作得出的。仿真结果证明了在有源区中不同的导带和价带分布以及电子和空穴分布。与具有1.89 eV InN带隙能量的结构相比,具有0.80 eV InN带隙能量的激光器结构具有更高的性能特性,例如输出功率,斜率效率和微分量子效率以及更低的阈值电流。

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