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Study of resistivity and majority carrier concentration of silicon damaged by neutron irradiation

机译:中子辐照损伤硅的电阻率和多数载流子浓度的研究

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Working characteristics of silicon radiation detectors have been observed to change, when irradiated at very large neutron fluences (phi>10(12) n/cm(2)), due to generation of defect levels and capture of majority carriers on these levels. Direct study and confirmation of these phenomena were made by measuring the Hall effect constant R-II and Resistivity, of the silicon material as a function of neutron irradiation of up to about 9 x 10(15) n/cm(2). It was found that, for fluences of about phi greater than or equal to 5.95x10(14) n/cm(2), the sign of the Hall constant R-H changes from negative to positive. Taking into account that, for phi greater than or equal to 1.19x10(14) n/cm(2), the value of rho is independent on fluence, we assumed that the damage, craused at those neutron fluences, was high enough to create disordered silicon crystal structures. ?his disordered silicon may contribute to the positive sign of R-II and make the rho of this material insensitive to further neutron irradiation. This can be explained by assuming that, for phi>1.19x10(14) n/cm(2), the created disordered silicon material has an equivalent resistance in series with the single crystal Si resistance. The contribution to rho of the disordered silicon is large enough to have a strong influence on the silicon characteristics. nle new defect structure was seen under a microscope on etched samples, irradiated at phi>10(13) n/cm(2). [References: 14]
机译:观察到硅辐射探测器的工作特性在以非常大的中子注量(phi> 10(12)n / cm(2))进行辐照时会发生变化,这是由于缺陷能级的产生和大多数载流子在这些能级上的捕获所致。这些现象的直接研究和确认是通过测量硅材料的霍尔效应常数R-II和电阻率作为中子辐照的函数来进行的,该中子辐照度高达约9 x 10(15)n / cm(2)。已发现,对于大约phi的注量大于或等于5.95x10(14)n / cm(2),霍尔常数R-H的符号从负变为正。考虑到,对于大于或等于1.19x10(14)n / cm(2)的phi,rho的值与注量无关,我们假设在中子注量作用下产生的损害足够高,可以产生无序的硅晶体结构。他的无序硅可能有助于R-II的正号,并使该材料的rho对进一步的中子辐照不敏感。这可以通过假设对于phi> 1.19x10(14)n / cm(2)来解释,所产生的无序硅材料具有与单晶硅电阻串联的等效电阻。无序硅对rho的贡献很大,足以对硅特性产生很大的影响。在显微镜下,在phi> 10(13)n / cm(2)照射的蚀刻样品上看不到新的缺陷结构。 [参考:14]

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