首页> 外文期刊>Nanoscience and Nanotechnology Letters >A Sub-1 V Bandgap Reference Based on Different Threshold MOSFETs Under 40 nm Process
【24h】

A Sub-1 V Bandgap Reference Based on Different Threshold MOSFETs Under 40 nm Process

机译:在40 nm工艺下基于不同阈值MOSFET的低于1 V带隙基准

获取原文
获取原文并翻译 | 示例
       

摘要

Based on different threshold MOSFETs in 40 nm CMOS process, a sub-1 V low-power bandgap voltage reference with second-order temperature compensation is designed. The reference generator employs the characteristics of the difference between gate and source voltages (ΔV_(GS)) of a high threshold NMOS transistor operating in the subthreshold region and a normal threshold NMOS transistor operating in the saturation region to achieve second-order temperature compensation. Simulation results show that a temperature coefficient of 2.3 ppm/℃ at 0.9 V is achieved from -40 ℃ to 85 ℃, and the reference generator operates under supply voltage ranging from 0.9 to 1.5 V with a power consumption lower than 1.2 μW.
机译:基于40 nm CMOS工艺中不同的阈值MOSFET,设计了具有二阶温度补偿的低于1 V的低功率带隙基准电压源。参考发生器利用在亚阈值区域中操作的高阈值NMOS晶体管和在饱和区域中操作的正常阈值NMOS晶体管的栅极和源极电压之间的差(ΔV_(GS))的特性来实现二阶温度补偿。仿真结果表明,在-40℃至85℃的温度下,在0.9 V时达到2.3 ppm /℃的温度系数,基准发生器在0.9至1.5 V的电源电压下工作,功耗低于1.2μW。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号