Influence of the molecular weight and imprint conditions on the formation of capillary bridges in nanolmprint lithography

摘要

Sub-100 nm patterns can be duplicated by nanoimprint lithography with high reproducibility, even on 200 mm wafers. Nevertheless, several problems have to be solved before this technique reaches a mature state for industrial applications. Several kinds of defect appear frequently in printed polymers. Some of them are induced by capillary effects and are related to mould deformation. Capillary bridges are observed on the flat surfaces around the pattern areas, or inside the printed structures. In this paper, the influence of the polymer molecular weight (M_w) on the capillary bridge distribution is presented. It will be shown that for smaller M_w, they appear first around the pattern areas and move towards the structures more rapidly. It is also demonstrated that this evolution depends directly on the printing temperature and pattern filling related to the feature density and the film thickness. Finally, it is shown that the influence of these parameters is related to the polymer viscosity, which is the dominant property of the capillary effects, and a trade-off has to be made between the limitation due to the capillary bridges, the decrease of the temperature, which is important to reduce the cycle time, and the sticking defects.