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InGaAs quantum dots grown on B-type high index GaAs substrates: surface morphologies and optical properties

机译:在B型高折射率GaAs衬底上生长的InGaAs量子点:表面形态和光学性质

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We systematically investigated the correlation between morphological and optical properties of InGaAs self-assembled quantum dots (QDs) grown by solid-source molecular beam epitaxy on GaAs (n11) B (n = 9, 8, 7, 5, 3, 2) substrates. Remarkably, all InGaAs QDs on GaAs( n11) B under investigation show optical properties superior to those for ones on GaAs( 100) as regards the photoluminescence (PL) linewidth and intensity. The morphology for growth of InGaAs QDs on GaAs ( n11) B, where n = 9, 8, 7, 5, is observed to have a rounded shape with a higher degree of lateral ordering than that on GaAs( 100). The optical property and the lateral ordering are best for QDs grown on a ( 511) B substrate surface, giving a strong correlation between lateral ordering and PL optical quality. Our results demonstrate the potential for high quality InGaAs QDs on GaAs( n11) B for optoelectronic applications.
机译:我们系统地研究了固体源分子束外延在GaAs(n11)B(n = 9、8、7、5、3、2)衬底上生长的InGaAs自组装量子点(QD)的形态和光学性质之间的相关性。值得注意的是,在研究中的GaAs(n11)B上的所有InGaAs QD在光致发光(PL)线宽和强度方面均优于GaAs(100)上的光学性质。在GaAs(n11)B上生长InGaAs QD的形态,其中n = 9、8、7、5呈圆形,且横向排列的程度比GaAs(100)高。光学特性和横向排序最适合在(511)B衬底表面上生长的QD,从而在横向排序和PL光学质量之间具有很强的相关性。我们的结果证明了在GaAs(n11)B上用于光电应用的高质量InGaAs QD的潜力。

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