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Significant enhancement of hole mobility in [110] silicon nanowires compared to electrons and bulk silicon

机译:与电子和体硅相比,[110]硅纳米线中的空穴迁移率显着提高

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Utilizing sp3d5s* tight-binding band structure and wave functions for electrons and holes we show that acoustic phonon limited hole mobility in [110] grown silicon nanowires (SiNWs) is greater than electron mobility. The room temperature acoustically limited hole mobility for the SiNWs considered can be as high as,2500 cm(2)/V s, which is nearly three times larger than the bulk acoustically limited silicon hole mobility. It is also shown that the electron and hole mobility for [110] grown SiNWs exceed those of similar diameter [100] SiNWs, with nearly 2 orders of magnitude difference for hole mobility. Since small diameter SiNWs have been seen to grow primarily along the [110] direction, results strongly suggest that these SiNWs may be useful in future electronics. Our results are also relevant to recent experiments measuring SiNW mobility.
机译:利用sp3d5s *紧密结合的能带结构和电子和空穴的波函数,我们表明,[110]生长的硅纳米线(SiNWs)中的声子限制了空穴的迁移率,大于电子的迁移率。所考虑的SiNW的在室温下受声学限制的空穴迁移率可能高达2500 cm(2)/ V s,这几乎是在体积上受声学限制的硅空穴迁移率的三倍。还显示出[110]生长的SiNWs的电子和空穴迁移率超过了相似直径[100] SiNWs的电子和空穴迁移率,空穴迁移率的差异接近2个数量级。由于已经看到小直径的SiNW主要沿[110]方向生长,因此结果强烈表明这些SiNW在未来的电子产品中可能会有用。我们的结果也与最近测量SiNW迁移率的实验有关。

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