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Dislocation dynamics modelling of radiation damage in thin films

机译:薄膜辐射损伤的位错动力学模型

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Transmission electron microscopy is a key tool for the extraction of information on radiation damage, the understanding of which is critical for materials development for nuclear fusion and fission reactors. Dislocations in TEM samples are subject to strong image forces, owing to the nanometric sample thicknesses, which may introduce artifacts in the damage analysis. Using dislocation dynamics, we elucidate the roles played by dislocation-surface interactions, dislocation-dislocation interactions and self-interactions due to climb for loop types observed in TEM. Comparisons with analytic solutions for a dislocation loop and an edge dislocation in a half-space are included, and the relationship between glide force and loop tilt examined. The parameters for convergence of the zero-traction boundary conditions are obtained, after which the evolution of dislocation structures in a thin film is studied. It is found that three main length scales govern the physical processes: the image force is governed by the distance of the loop from the surface and scales with the film thickness; the glide force is governed by the image stress as well as the loop-loop interaction stress which is in turn governed by the loop spacing L ~ 1/√ρ, where ρ is the loop density; finally, the climb force depends on the loop size. The three forces compete and their relative magnitudes define the evolution pathway of the dislocation structure.
机译:透射电子显微镜是提取辐射损伤信息的关键工具,对此的理解对于核聚变和裂变反应堆材料的开发至关重要。由于纳米样品的厚度,TEM样品中的位错会受到强烈的图像力,这可能会在损伤分析中引入伪影。使用位错动力学,我们阐明了由于TEM中观察到的环类型的攀升,位错-表面相互作用,位错-位错相互作用和自相互作用所起的作用。包括与位错环和半空间中的边缘位错的解析解的比较,并研究了滑移力和环倾角之间的关系。得到了零牵引边界条件收敛的参数,然后研究了薄膜中位错结构的演化。已经发现,三个主要的长度标尺控制着物理过程:成像力由环与表面的距离控制,标尺随膜厚而定;滑行力由图像应力以及环-环相互作用应力控制,环-环相互作用应力又由环间距L〜1 /√ρ控制,其中ρ是环密度。最后,爬升力取决于环的大小。这三种力相互竞争,它们的相对大小定义了位错结构的演化途径。

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