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首页> 外文期刊>Microscopy and microanalysis: The official journal of Microscopy Society of America, Microbeam Analysis Society, Microscopical Society of Canada >Density Functional Theory Modeling of Low-Loss Electron Energy-Loss Spectroscopy in Wurtzite III-Nitride Ternary Alloys
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Density Functional Theory Modeling of Low-Loss Electron Energy-Loss Spectroscopy in Wurtzite III-Nitride Ternary Alloys

机译:纤锌矿型III-氮化物三元合金中低损耗电子能量损失谱的密度泛函理论建模

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摘要

In the present work, the dielectric response of III-nitride semiconductors is studied using density functional theory (DFT) band structure calculations. The aim of this study is to improve our understanding of the features in the low-loss electron energy-loss spectra of ternary alloys, but the results are also relevant to optical and UV spectroscopy results. In addition, the dependence of the most remarkable features with composition is tested, i.e. applying Vegard's law to band gap and plasmon energy. For this purpose, three wurtzite ternary alloys, from the combination of binaries AlN, GaN, and InN, were simulated through a wide compositional range (i.e., AlxGa1 (-) N-x, InxAl1 (-) (x) N, and InxGa1 (-) (x) N, with x = [0,1]). For this DFT calculations, the standard tools found in Wien2k software were used. In order to improve the band structure description of these semiconductor compounds, the modified Becke-Johnson exchange-correlation potential was also used. Results from these calculations are presented, including band structure, density of states, and complex dielectric function for the whole compositional range. Larger, closer to experimental values, band gap energies are predicted using the novel potential, when compared with standard generalized gradient approximation. Moreover, a detailed analysis of the collective excitation features in the dielectric response reveals their compositional dependence, which sometimes departs from a linear behavior (bowing). Finally, an advantageous method for measuring the plasmon energy dependence from these calculations is explained.
机译:在本工作中,使用密度泛函理论(DFT)带结构计算研究了III型氮化物半导体的介电响应。这项研究的目的是增进我们对三元合金低损耗电子能损谱特征的理解,但结果也与光学和紫外光谱学结果有关。另外,测试了最显着特征与组成的相关性,即将Vegard定律应用于带隙和等离子体激元能量。为此,在很宽的成分范围内(即AlxGa1(-)Nx,InxAl1(-)(x)N和InxGa1(-)组成了三种AlN,GaN和InN的组合的三种纤锌矿三元合金。 )(x)N,其中x = [0,1])。对于此DFT计算,使用了Wien2k软件中提供的标准工具。为了改善这些半导体化合物的能带结构描述,还使用了改进的Becke-Johnson交换相关势。给出了这些计算的结果,包括整个组成范围的能带结构,态密度和复介电函数。与标准的广义梯度近似法相比,使用新型电势可以预测更大,更接近实验值的带隙能量。此外,对介电响应中集体激发特征的详细分析显示它们的成分相关性,有时会偏离线性行为(波动)。最后,解释了一种从这些计算中测量等离激元能量依赖性的有利方法。

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