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首页> 外文期刊>Microelectronics international: Journal of ISHM--Europe, the Microelectronics Society--Europe >Pressure indicating film characterization of pressure distribution in eutectic Au/Sn wafer-to-wafer bonding
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Pressure indicating film characterization of pressure distribution in eutectic Au/Sn wafer-to-wafer bonding

机译:共晶Au / Sn晶片对晶片键合中压力分布的压力指示膜特性

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摘要

Purpose - The purpose of this paper is to characterize pressure non-uniformity in a wafer-to-wafer bond chamber using pressure sensitive paper.Design/methodology/approach - Pressure non-uniformity in a wafer-to-wafer bond chamber is characterized using pressure sensitive paper. Theeffect of poor pressure uniformity is discussed, and the non-uniformity corrected for use in a eutectic Au/Sn based wafer-to-wafer bond. Findings - Several types of under solder metallization were also investigated, with Nb/Au seed metal providing the best overall result with good soldercompression, liquid proof seal and minimal solder spill-out. Solder compression versus pressure applied was studied to achieve an excellent gap control(2-3 μm) between the bonded substrates. Originality/value - This paper shows that characterization of applied pressure measured directly at the substrate is an important aspect in thedevelopment of high yielding bond processes.
机译:目的-本文的目的是使用压敏纸表征晶圆对晶圆键合室中的压力不均匀性。设计/方法/方法-晶圆对晶圆键合室中的压力不均匀性的特征在于使用压敏纸。讨论了不良压力均匀性的影响,并对不均匀性进行了校正,以用于基于共晶Au / Sn的晶片对晶片键合。发现-还研究了几种类型的焊锡不足金属化,其中Nb / Au籽晶金属具有最佳的总体效果,具有良好的焊锡压缩性,防液密封性和最小的焊锡溢出。研究了焊料压缩与施加压力之间的关系,以实现粘合基板之间出色的间隙控制(2-3μm)。独创性/价值-本文表明,直接在基材上测量的施加压力的特性是开发高屈服粘合工艺的重要方面。

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