首页> 外文会议>Annal International Wafer-Level Packaging Conference and Tabletop Exhibition >PRESSURE INDICATING FILM CHARACTERIZATION OF PRESSURE DISTRIBUTION IN EUTECTIC AU/SN WAFER-TO-WAFER BONDING
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PRESSURE INDICATING FILM CHARACTERIZATION OF PRESSURE DISTRIBUTION IN EUTECTIC AU/SN WAFER-TO-WAFER BONDING

机译:压力指示共晶Au / Sn晶片到晶片粘合中压力分布的薄膜表征

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Pressure non-uniformity in a wafer to wafer bond chamber was characterized using pressure sensitive paper. The effect of poor pressure uniformity is discussed, and the nonuniformity was corrected for use in a eutectic Au/Sn based wafer-to-wafer bond. Several types of under solder metallization were also investigated, with Nb/Au seed metal providing the best overall result with good solder compression, liquid proof seal, and minimal solder spill-out. Thirdly, solder compression versus pressure applied was studied to achieve an excellent gap control (2 - 3 μm) between the bonded substrates.
机译:使用压敏纸表征晶片到晶片粘合室的压力不均匀性。 讨论了压力均匀性差的效果,校正不均匀性以用于共晶Au / Sn基晶片到晶片键。 还研究了几种类型的焊料金属化,Nb / Au种子金属提供了良好的焊料压缩,液体防尘密封和最小焊料溢出的总体结果。 第三,研究了焊料压缩与压力施加,在粘合的基材之间实现优异的间隙控制(2-3μm)。

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