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Design, fabrication, and testing of VDP MEMS pressure sensors

机译:VDP MEMS压力传感器的设计,制造和测试

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摘要

In this paper, a four-terminal piezoresistive sensor commonly known as a van der Pauw (VDP) structure is presented for its application to MEMS pressure sensing. In a recent study, our team has determined the relation between the biaxial stress state and the piezoresistive response of a VDP structure by combining the VDP resistance equations with the equations governing silicon piezoresistivity and has proposed a new piezoresistive pressure sensor. It was observed that the sensitivity of the VDP sensor is over three times higher than the conventional filament type Wheatstone bridge resistor. To check our theoretical findings, we fabricated several (100) silicon diaphragms with both the VDP sensors and filament resistor sensors on the same wafer so both the sensor elements have same doping concentration. Several diaphragms had VDP sensors of different sizes and orientations to find out their geometric effects on pressure sensitivity. The diaphragms were subjected to known pressures, and the pressure sensitivities of both types of sensors were measured using an in-house built calibration setup. It was found that the VDP devices had a linear response to pressure as expected, and were more sensitive than the resistor sensors. Also, the VDP sensors provided a number of additional advantages, such as its size independent sensitivity and simple fabrication steps due to its simple geometry.
机译:在本文中,提出了一种四端子压阻传感器,通常称为范德堡(VDP)结构,以将其应用于MEMS压力感测。在最近的研究中,我们的团队通过将VDP电阻方程与控制硅压阻率的方程相结合,确定了VDP结构的双轴应力状态与压阻响应之间的关系,并提出了一种新型的压阻压力传感器。观察到,VDP传感器的灵敏度是传统灯丝型惠斯通电桥电阻的三倍以上。为了检验我们的理论发现,我们在同一晶片上制造了几(100)个硅膜片,同时使用了VDP传感器和灯丝电阻器传感器,因此两个传感器元件都具有相同的掺杂浓度。几个膜片具有不同大小和方向的VDP传感器,以了解它们对压力灵敏度的几何影响。隔膜承受已知压力,并且使用内部内置的校准装置测量两种类型传感器的压力灵敏度。已经发现,VDP设备具有预期的线性压力响应,并且比电阻传感器更灵敏。此外,VDP传感器还具有许多其他优点,例如其尺寸独立的灵敏度以及由于其简单的几何形状而简化的制造步骤。

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