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Metrology of electromagnetic static actuation of MEMS microbridge using atomic force microscopy

机译:利用原子力显微镜对MEMS微桥进行电磁静态致动的计量

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The objective of this paper is to describe application of atomic force microscopy (AFM) for characterization and calibration of static deflection of electromagnetically and/or thermally actuated micro-electromechanical (MEMS) bridge. The investigated MEMS structure is formed by a silicon nitride bridge and a thin film metal path enabling electromagnetic and/or thermal deflection actuation. We present how static microbridge deflection can be measured using contact mode AFM technology with resolution of 0.05 nm in the range of up to tens of nm. We also analyze, for very small structure deflections and under defined and controlled load force varied in the range up to ca. 32 nN, properties of thermal and electromagnetical microbridge deflection actuation schemes. (C) 2016 Elsevier Ltd. All rights reserved.
机译:本文的目的是描述原子力显微镜(AFM)在表征和校准电磁和/或热驱动微机电(MEMS)桥的静态挠度中的应用。所研究的MEMS结构由氮化硅桥和能够实现电磁和/或热偏转驱动的薄膜金属路径形成。我们介绍了如何使用接触式原子力显微镜技术在高达数十纳米的范围内以0.05纳米的分辨率测量静态微桥挠度。我们还分析了非常小的结构挠度以及在限定和受控的负载力范围内变化的最大范围。 32 nN,热和电磁微桥偏转驱动方案的特性。 (C)2016 Elsevier Ltd.保留所有权利。

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