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首页> 外文期刊>Materials science in semiconductor processing >Rectifying performance of p-type tin(II) sulfide contacts on n-type silicon: Effect of silicon nanowire sulfidation on electronic transport of heterojunction diodes
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Rectifying performance of p-type tin(II) sulfide contacts on n-type silicon: Effect of silicon nanowire sulfidation on electronic transport of heterojunction diodes

机译:p型硫化锡(II)触点在n型硅上的整流性能:硅纳米线硫化对异质结二极管电子传输的影响

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摘要

The effect of Si-nanowire (SiNW) sulfidation on electronic transport of heterojunction diodes based on the p-type tin(II) sulfide (SnS) and n-type Si with SiNW arrays was investigated in this study. The p-type SnS/SiNWs-type Si diode without SiNW sulfidation shows a poor rectifying behavior with an ideality factor (eta) of 3.7 and high leakage. However, the p-type SnS/SiNWs-type Si diode with SiNW sulfidation shows a good rectifying behavior with eta of 1.8 and low leakage. Such an. improvement indicates that a good passivation is formed at the interface as a result of the formation of Si-S bonds. Therefore, the increased photocurrent density can be interpreted by the device rectifying performance and interface passivation. (C) 2015 Elsevier Ltd. All rights reserved.
机译:本研究研究了Si-纳米线(SiNW)硫化对基于p型硫化锡(II)和n型Si和SiNW阵列的异质结二极管电子传输的影响。没有进行SiNW硫化的p型SnS / SiNWs / n型Si二极管显示出不良的整流性能,理想因数(η)为3.7,且漏电流很高。然而,具有SiNW硫化作用的p型SnS / SiNWs / n型Si二极管显示出良好的整流性能,η为1.8,且漏电流低。这样的。改善表明,由于形成了Si-S键,在界面处形成了良好的钝化层。因此,增加的光电流密度可以通过器件的整流性能和界面钝化来解释。 (C)2015 Elsevier Ltd.保留所有权利。

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