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Impact of substrate temperature on the structural, optical and electrical properties of thermally evaporated SnS thin films

机译:衬底温度对热蒸发SnS薄膜的结构,光学和电学性质的影响

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Tin Sulfide thin films were deposited on soda lime glass substrates at three different substrate temperatures using thermal evaporation technique. The impact of substrate temperature on the deposited films has been studied thoroughly. Surface morphology was modified with the substrate temperature. XRD spectra shows orthorhombic end-centered type SnS having (1 1 0) orientation. The crystallite size increases with the increase in the substrate temperature. At a high substrate temperature (450 degrees C) small grains form on the surface and crystallinity decreases. The effect of substrate temperature on optical and electrical properties has been studied using UV-Vis-NIR Spectrophotometer and Hall effect respectively. With the increase in the substrate temperature there is a substantial decrease in the transmittance and bandgap value. Refractive index (n), dielectric constant (epsilon(1)) and extinction co-efficient (k) have also been calculated for different substrate temperatures.
机译:使用热蒸发技术,在三种不同的基板温度下,将硫化锡薄膜沉积在钠钙玻璃基板上。衬底温度对沉积膜的影响已被彻底研究。表面形态随基材温度而改变。 XRD谱图显示具有(1 1 0)取向的斜方心中心型SnS。微晶尺寸随着基板温度的升高而增加。在较高的基板温度(450摄氏度)下,表面会形成小晶粒,并且结晶度降低。分别使用UV-Vis-NIR分光光度计和霍尔效应研究了基板温度对光学和电学性质的影响。随着基板温度的升高,透射率和带隙值显着降低。还针对不同的基板温度计算了折射率(n),介电常数(ε(1))和消光系数(k)。

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