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Photoreflectance characterization of vanadium-doped GaAs layers grown by metalorganic vapor phase epitaxy

机译:金属有机气相外延生长钒掺杂GaAs层的光反射特性

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We characterized the vanadium-doped (GaAs:V) layers grown on GaAs substrate by metalorganic vapor phase epitaxy. The conductivity of the samples is checked by the Hall effect measurements, and it is n type with electrons concentration ranging from 2 x 10(13) to 2 x 10(17) cm(-3). We used the photoreflectance technique (PR) to study the effect of vanadium doping on the optical properties of GaAs. Our experimental results show that the built-in electric field F and the broadening parameter Gamma(0) increase with V-doping concentration. Furthermore, the temperature dependence of the built-in electric field and the broadening parameter of GaAs:V samples have been investigated by PR. It has been observed that these parameters increase with increasing temperature. The decrease of the built-in electric field with decreasing temperature is due to the photovoltage effect.We characterized the vanadium-doped GaAs (GaAs:V) layers grown on GaAs substrate by metalorganic vapor phase epitaxy. (C) 2014 Elsevier Ltd. All rights reserved.
机译:我们表征了通过有机金属气相外延生长在GaAs衬底上的钒掺杂(GaAs:V)层。样品的电导率通​​过霍尔效应测量进行检查,它是n型,电子浓度范围为2 x 10(13)到2 x 10(17)cm(-3)。我们使用光反射技术(PR)研究了钒掺杂对GaAs光学性能的影响。我们的实验结果表明,内置电场F和展宽参数Gamma(0)随着V掺杂浓度的增加而增加。此外,通过PR研究了内置电场对温度的依赖性以及GaAs:V样品的展宽参数。已经观察到这些参数随温度升高而增加。内置电场随着温度的降低而降低是由于光电压效应所致。我们利用金属有机气相外延技术对生长在GaAs衬底上的钒掺杂GaAs(GaAs:V)层进行了表征。 (C)2014 Elsevier Ltd.保留所有权利。

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