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首页> 外文期刊>Materials Science and Technology: MST: A publication of the Institute of Metals >Protrusion and whisker growth on tin coated copper substrate under stresses
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Protrusion and whisker growth on tin coated copper substrate under stresses

机译:应力作用下镀锡铜基板上的突起和晶须生长

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摘要

Tin thin films were coated on copper substrates using chemical method. Tin coated copper specimens under continuously applied compressive and tensile stresses were oxidised at 100°C for 8 days. Protrusion and whisker growth behaviour of tin coated copper specimens was characterised by scanning electron microscope, X-ray diffractometer and transmission electron microscope. The results show that continuously applied compressive stress on tin coated copper specimens would enhance the growth of whisker while tensile stress would reduce whisker growth. A SnO_2 layer was formed during oxidation and intermetallics of Cu_3Sn and Cu_6Sn_5 were formed between SnO_2 layer and copper substrate, which built up the residual compressive stresses in the coated tin layer. Continuously applied stress on the specimens can change the magnitude of residual compressive stress in coated tin layer, which affects the driving force for protrusion and whisker formation and growth.
机译:使用化学方法将锡薄膜涂覆在铜基板上。连续施加压缩应力和拉伸应力的镀锡铜试样在100°C氧化8天。用扫描电子显微镜,X射线衍射仪和透射电子显微镜表征了镀锡铜样品的晶须突起和晶须生长行为。结果表明,在镀锡的铜样品上连续施加压应力会增强晶须的生长,而张应力则会降低晶须的生长。在氧化过程中形成了SnO_2层,在SnO_2层和铜基板之间形成了Cu_3Sn和Cu_6Sn_5的金属间化合物,从而在镀锡层中形成了残余压缩应力。在样品上不断施加应力会改变镀锡层中残余压应力的大小,从而影响突起和晶须形成和生长的驱动力。

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