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Transmission Electron Microscopy of Interfaces in Joints between Pb-Free Solders and Electroless Ni-P

机译:无铅焊料与化学镀Ni-P的接合处的界面的透射电子显微镜

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Microstructures of joints between a Ni-8 mass percent P UBM (under bump metallization) and three different Pb-free solders, i.e., Sn-Ag, Sn-Ag-Cu and Sn-Ag-Cu-Bi were studied by transmission electron microscopy. The phases formed near the joint interfaces as well as inside the solders during soldering were identified on the basis of electron diffraction and EDX analysis without ambiguity. In the Ni-P under bump metallization near the interface with the solders, P-denuded Ni-20 mass percent P layer was observed, where a high density of columnar voids were formed. Also, in Ni(Cu) SnP intermetallic, which is adjacent to the P-denuded Ni-20 mass percent P, a high density of spherical voids were observed. These voids degrade the joint strength. Change of the above microstructures during thermal cycling between 253K and 453K was also observed.
机译:通过透射电子显微镜研究了Ni-8质量百分比的P UBM(凸点金属化)和三种不同的无铅焊料(Sn-Ag,Sn-Ag-Cu和Sn-Ag-Cu-Bi)之间的接头微观结构。 。根据电子衍射和EDX分析,可以清楚地确定在焊接过程中在接合处附近以及焊料内部形成的相。在与焊料的界面附近的凸块金属化下的Ni-P中,观察到P-剥蚀的Ni-20质量%的P层,其中形成了高密度的柱状空隙。而且,在与P-去离子的Ni-20质量百分比P相邻的Ni(Cu)SnP金属间化合物中,观察到高密度的球形空隙。这些空隙降低了接头强度。还观察到在253K和453K之间的热循环过程中上述微结构的变化。

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