FILTER HELPS ENABLE MEMORY AND MICROPROCESSOR CHIP PRODUCTION AT THE 22 nm TECHNOLOGY NODE

摘要

Pall's Ultipleat(R) SP DR series filter reduces defects and improves productivity in Front End of Line (FEOL) wet chemical surface preparation processes (www.pall.com). Pall Corporation have announced a next generation, highly asymmetric membrane technology for semiconductor fabrication that advances wet chemical filtration performance to a level of 10 nm and reduces energy costs. The new Pall Ultipleat? SP DR series filter cartridge was unveiled at SEMICON West 2010, the flagship annual event for the global microelectronics industry. "Pall's new Ultipleat SP DR series filter reduces defects and improves productivity by increasing filtration efficiency in FEOL wet chemical surface preparation processes," said Jon Weiner, President, Pall Microelectronics. "This includes critical pre-clean stages where removal of a 'killer defect' particle size down to 10 nm is required."