Thermal Decomposition of Tetrakis(ethylmethylamido) Titanium for Chemical Vapor Deposition of Titanium Nitride

摘要

The thermal decomposition of tetrakis(ethylmethylamido) titanium (TEMAT) has been investigated in Ar and H_2 gas atmospheres at gas temperatures of 100-400 deg C by using Fourier Transform infrared spectroscopy (FTIR) as a fundamental study for the chemical vapor deposition (CVD) of titanium nitride (TiN) thin film.The activation energy for the decomposition of TEMAT was estimated to be 10.92 kcal/mol and the reaction order was determined to be the first order.The decomposition behavior of TEMAT was affected by ambient gases.TEMAT was decomposed into the intermediate forms of imine (C=N) compounds in Ar and H_2 atmosphere,but additional nitrile (RC ident to N) compound was observed only in H_2 atmosphere.The decomposition rate of TEMAT under H_2 atmosphere was slower than that in Ar atmosphere,which resulted in the extension of the regime of the surface reaction control in the CVD TiN process.