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Strain state in single quantum well GaAs/1ML-InAs/GaAs(100) analysed by high-resolution X-ray diffraction

机译:高分辨率X射线衍射分析单量子阱GaAs / 1ML-InAs / GaAs(100)中的应变态

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摘要

The epitaxy-induced tetragonal strain in one monolayer of InAs buried in a GaAs(100) crystal is determined by measuring weak oscillations in X-ray reflectivity profiles. It is shown that the reflectivity of such heterostructure consists of a sinusoidal modulation of the usual rocking curve of a thick crystal. The oscillation period provides the distance of the buried layer from the crystal surface and the maximum positions in oscillations give the displacement induced by the buried layer. The vertical spacing between the In and As atom planes is found to be 1.64 +/- 0.02 Angstrom, which is consistent with an elastic behaviour. [References: 13]
机译:通过测量X射线反射率曲线中的弱振荡来确定在GaAs(100)晶体中掩埋的InAs单层中的外延诱导四方应变。结果表明,这种异质结构的反射率由厚晶体通常的摇摆曲线的正弦调制组成。振荡周期提供了掩埋层到晶体表面的距离,并且振荡中的最大位置给出了由掩埋层引起的位移。发现In和As原子平面之间的垂直间距为1.64 +/- 0.02埃,这与弹性行为一致。 [参考:13]

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