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Pulse reversal plating of nickel and nickel alloys for microgalvanics

机译:微型电镀镍和镍合金的脉冲反转镀

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摘要

The use of pulse reversal (PR) plating, as an alternative to the use of additives for electrochemical deposition of nickel, is studied. With optimised pulse plating parameters, and in some cases in combination with additives, substantial improvement of the deposit properties can be achieved. Utilising chloride-type baths, PR plating of pure nickel (and harder nickel-cobalt alloys) have been used to fabricate tools for micro-injection moulding (Polymer Structures for μTas, EuroSensors, Copenhagen, 27-30 August, 2000) and micromechanical structures. Furthermore, preliminary results from pulse plating experiments with ternary magnetic alloys, comprising 50-60% Co, 25-35% Fe and 10-20% Ni, will be reported. For both pure nickel and nickel alloys good chemically stable electrolytes have been developed, and the deposits are smooth with low residual stress. None of the electrolytes contain sulphur co-depositing additives (such as saccharin) nor wetting agents.
机译:研究了使用脉冲反转(PR)镀层,代替使用添加剂进行镍电化学沉积的方法。通过优化的脉冲电镀参数,并在某些情况下与添加剂结合,可以实现沉积性能的显着改善。利用氯化物浴,对纯镍(及较硬的镍钴合金)进行PR镀层已用于制造用于微注射成型的工具(μTas的聚合物结构,EuroSensors,哥本哈根,2000年8月27-30日)和微机械结构。此外,将报道使用含50-60%Co,25-35%Fe和10-20%Ni的三元磁性合金进行脉冲电镀实验的初步结果。对于纯镍和镍合金,都已开发出良好的化学稳定电解质,并且沉积物光滑且残留应力低。电解质均不含硫共沉积添加剂(如糖精)或润湿剂。

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