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Characteristics of W- and Ti-doped VO2 thin films prepared by sol-gel method

机译:溶胶凝胶法制备掺W和Ti的VO2薄膜的特性

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W- and Ti-doped VO2 thin films were deposited onto sapphire by the sol-gel method. Both films were grown with (020)-preferred direction. Doping of W had a great effect on the transition behaviors. A 1.2 atom % W-doped VO2 film showed a largely reduced resistance in the insulator state and decreased the transition temperature to 313 K. However, Ti-doped VO2 film had a little change of the transition temperature, and it was 350 K, even for the 20 atom % Ti doping. The resistance in the metal state was very large, which means a markedly small change of the resistance at the transition temperature. Further study is required for understanding the effects of doping VO2 film with metal ions.
机译:通过溶胶-凝胶法将掺有W和Ti的VO2薄膜沉积到蓝宝石上。两种膜均以(020)优先方向生长。 W的掺杂对过渡行为有很大的影响。掺杂1.2原子%的W的VO2膜在绝缘体状态下电阻大大降低,并将转变温度降低至313K。但是,掺Ti的VO2膜的转变温度变化很小,甚至为350K。对于20原子%的Ti掺杂。金属状态的电阻非常大,这意味着在转变温度下电阻的变化很小。需要进一步的研究以了解用金属离子掺杂VO2薄膜的效果。

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