首页> 外文期刊>Electrochemical and solid-state letters >The Reliability of Ni Contacts to n-SiC Subjected to Pulsed Thermal Fatigue
【24h】

The Reliability of Ni Contacts to n-SiC Subjected to Pulsed Thermal Fatigue

机译:脉冲热疲劳下Ni接触n-SiC的可靠性

获取原文
获取原文并翻译 | 示例
           

摘要

Laboratory experiments which mimic the acutecyclic thermal loading characteristics of pulsed power deviceswitching operation have been developed. Ni contacts to n-SiCwere the device components selected for cyclic thermal testing.Modifications of the contact-SiC materials properties in responseto cyclic thermal fatigue were quantitatively assessed viaRutherford backscattering spectrometry, nanoindentation testing,and current-voltage measurements. Decreases in nanohardnessand elastic modulus were observed in response to thermal fatigue.No compositional modifications were observed at the metal-semiconductor interface. Our results demonstrated that themajority of the material changes were initiated after the firstthermal pulse and that the effects of the subsequent thermalcycling (up to 10 pulses) were negligible. The stability of themetal-semiconductor interface after exposure to repeated pulsedthermal cycling lends support for the utilization of Ni as acontact metallization for pulsed power switching applications.
机译:已经开发了模仿脉冲功率设备开关操作的急性循环热负荷特性的实验室实验。 Ni-SiC的Ni触点是用于循环热测试的器件组件。通过Rutherford背散射光谱,纳米压痕测试和电流-电压测量,定量评估了接触SiC材料响应循环热疲劳的性能变化。观察到响应于热疲劳,纳米硬度和弹性模量降低。在金属-半导体界面处未观察到组成改变。我们的结果表明,大多数材料变化是在第一个热脉冲之后开始的,随后的热循环(最多10个脉冲)的影响可以忽略不计。暴露于重复的脉冲热循环后,金属-半导体界面的稳定性为将Ni用作脉冲功率开关应用的接触金属镀层提供了支持。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号