Application of multiblock and hierarchical PCA and PLS models for analysis of AC voltammetric data

摘要

Several multiblock and hierarchical calibration techniques have been applied to the determination of the brightener concentration in industrial copper electroplating baths. Hierarchical Principal Component Regression (HPCR), Hierarchical Partial Least Squares (HPLS), Consensus PCR (CPCR), and Multiblock PLS (MBPLS) were used to build and test calibration models based on AC voltammetric data. All of the hierarchical and multiblock techniques employed produce a reliable calibration model and provide information about its robustness.